P5000
The P5000 platform is an AMAT multi-cavity equipment platform that can install four cavities. The etching cavities include Mark II, MxP, MxP+, Super-E, etc., which can be used for etching silicon oxide, silicon nitride, polycrystalline silicon, silicon and metal materials.
The CVD cavity can be used for chemical vapor deposition of materials such as silicon oxide, silicon nitride, and tungsten metal.
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Product Features
1. Equipment covers a small area, high space utilization rate, suitable for large-scale production.
2. Optional LCD operation panel.
3. Optional dual hard drive system.
4. Different cavity configurations can be customized to achieve multiple uses for one machine.
5. Upgradable compatible transparent film.
6. Provide various new process development and solutions.
